Invention Grant
- Patent Title: Reactive particles supply system
-
Application No.: US17129747Application Date: 2020-12-21
-
Publication No.: US11810765B2Publication Date: 2023-11-07
- Inventor: Asaf Gutman , Irit Ruach-Nir , Kfir Luria , Sven Ruhle , Guy Eytan
- Applicant: Applied Materials Israel Ltd.
- Applicant Address: IL Rehovot
- Assignee: Applied Materials Israel Ltd.
- Current Assignee: Applied Materials Israel Ltd.
- Current Assignee Address: IL Rehovot
- Agency: KILPATRICK TOWNSEND & STOCKTON LLP
- Main IPC: H01J37/32
- IPC: H01J37/32 ; F16K3/04 ; C23C16/44 ; F16K3/32 ; F16K3/34 ; C23C14/00 ; F16K3/08

Abstract:
A reactive particles supply system that may include an adjustable gas supply unit that is arranged to supply gas and to set a gas condition, a reactive particles supply unit that may be arranged to receive the gas, and an adjustable reactive particles output unit that may include a reactive particles input, a second reactive particles output, and a reactive particles path. The second reactive particles output is configured to output reactive particles towards an opening of a vacuumed chamber. The adjustable reactive particles output unit is arranged to mechanically configure at least one element of the reactive particles path according to the reactive particles condition.
Public/Granted literature
- US20220199370A1 REACTIVE PARTICLES SUPPLY SYSTEM Public/Granted day:2022-06-23
Information query