Invention Grant
- Patent Title: Light source system and projection apparatus
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Application No.: US17420509Application Date: 2019-12-23
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Publication No.: US11822221B2Publication Date: 2023-11-21
- Inventor: Zuqiang Guo , Ning Lu , Yi Li
- Applicant: APPOTRONICS CORPORATION LIMITED
- Applicant Address: CN Guangdong
- Assignee: APPOTRONICS CORPORATION LIMITED
- Current Assignee: APPOTRONICS CORPORATION LIMITED
- Current Assignee Address: CN Guangdong
- Agency: Nixon Peabody LLP
- Agent Jeffrey L. Costellia
- Priority: CN 1910005627.9 2019.01.03
- International Application: PCT/CN2019/127272 2019.12.23
- International Announcement: WO2020/140780A 2020.07.09
- Date entered country: 2021-07-02
- Main IPC: G03B21/20
- IPC: G03B21/20 ; G02B26/00 ; G02B27/14

Abstract:
Provided is a light source system, including: an excitation light source for emitting excitation light; a wavelength conversion device provided with a conversion layer which is used to perform wavelength conversion on at least a portion of the excitation light to obtain stimulated light, and to exit the stimulated light and the unconverted excitation light; and a dichroic assembly which is used to guide the stimulated light exited from the conversion layer to propagate along the second optical path, and finally to exit from the light source system along the exit optical path, and to guide at least a portion of the unconverted excitation light exited from the conversion layer to transmit on a path, which is not the exit optical path. Further provided is a projection device comprising the above light source system.
Public/Granted literature
- US20220082915A1 LIGHT SOURCE SYSTEM AND PROJECTION APPARATUS Public/Granted day:2022-03-17
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