Invention Grant
- Patent Title: Semiconductor device
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Application No.: US17363748Application Date: 2021-06-30
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Publication No.: US11832430B2Publication Date: 2023-11-28
- Inventor: Mingyu Kim , Munhyeon Kim , Daewon Ha
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: F. CHAU & ASSOCIATES, LLC
- Priority: KR 20200135324 2020.10.19
- Main IPC: H10B10/00
- IPC: H10B10/00 ; H01L29/10 ; G11C11/412

Abstract:
A semiconductor device may include a pull-down transistor and a pull-up transistor disposed on a substrate. Each of the pull-down transistor and the pull-up transistor may include an active pattern disposed on the substrate; two source/drain patterns disposed on the active pattern; a channel pattern interposed between the two source/drain patterns, the channel pattern including semiconductor patterns that are disposed in a noncontiguous stack, such that a semiconductor pattern does not contact an adjacent semiconductor pattern; and a gate electrode crossing the channel pattern in a first direction. There may be more or less semiconductor patterns of the pull-down transistor as compared to semiconductor patterns of the pull-up transistor.
Public/Granted literature
- US20220122994A1 SEMICONDUCTOR DEVICE Public/Granted day:2022-04-21
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