Invention Grant
- Patent Title: Method for manufacturing damper device, lithographic apparatus, projection system, and device manufacturing method
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Application No.: US16772406Application Date: 2018-11-15
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Publication No.: US11835106B2Publication Date: 2023-12-05
- Inventor: Derk Ten Hoopen , Francois-Xavier Debiesme , Eric Pierre-Yves Vennat
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP 207548 2017.12.15
- International Application: PCT/EP2018/081326 2018.11.15
- International Announcement: WO2019/115134A 2019.06.20
- Date entered country: 2020-06-12
- Main IPC: G03F7/20
- IPC: G03F7/20 ; F16F9/30 ; F16F9/32 ; G03F7/00
Abstract:
The invention relates a method for manufacturing a damper device including a first part and a second part, said method comprising the following steps: a) providing a damping material in a space in between the first part and the second part, such that the damping material is in a compressed state in the space; and b) heating the device to a predetermined temperature in order to adhere the damping material to the first part and the second part.
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Information query
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