Invention Grant
- Patent Title: Topcoat compositions and photolithographic methods
-
Application No.: US14577473Application Date: 2014-12-19
-
Publication No.: US11846885B2Publication Date: 2023-12-19
- Inventor: Cong Liu , Doris H. Kang , Deyan Wang , Cheng-Bai Xu , Mingqi Li , Chunyi Wu
- Applicant: Rohm and Haas Electronic Materials LLC
- Applicant Address: US MA Marlborough
- Assignee: ROHM AND HAAS ELECTRONIC MATERIALS, LLC
- Current Assignee: ROHM AND HAAS ELECTRONIC MATERIALS, LLC
- Current Assignee Address: US MA Marlborough
- Agency: CANTOR COLBURN LLP
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F7/11 ; G03F7/16 ; G03F7/32 ; C09D201/00 ; C09D201/02 ; C08F220/10 ; C09D7/20 ; C08L101/12 ; C09D133/14 ; C09D133/16 ; H01L21/027 ; C08K5/101 ; C08K5/05
Abstract:
Topcoat compositions are provided that can be used in immersion lithography to form photoresist patterns. The topcoat compositions include a solvent system that comprises 1) a first organic solvent represented by formula (I),
wherein R1 and R2 are alkyl groups of 3-8 carbons and the total number of carbons of R1 and R2 is greater than 6; and
2) a second organic solvent that is a C4 to C10 monovalent alcohol.
wherein R1 and R2 are alkyl groups of 3-8 carbons and the total number of carbons of R1 and R2 is greater than 6; and
2) a second organic solvent that is a C4 to C10 monovalent alcohol.
Public/Granted literature
- US20150323869A1 TOPCOAT COMPOSITIONS AND PHOTOLITHOGRAPHIC METHODS Public/Granted day:2015-11-12
Information query
IPC分类:
