Invention Grant
- Patent Title: Photopolymer composition
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Application No.: US17280077Application Date: 2020-06-29
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Publication No.: US11851515B2Publication Date: 2023-12-26
- Inventor: Seokhoon Jang , Heon Kim , Se Hyun Kwon , Yeongrae Chang
- Applicant: LG CHEM, LTD.
- Applicant Address: KR Seoul
- Assignee: LG Chem, Ltd.
- Current Assignee: LG Chem, Ltd.
- Current Assignee Address: KR Seoul
- Agency: Bryan Cave Leighton Paisner LLP
- Priority: KR 20190079367 2019.07.02
- International Application: PCT/KR2020/008465 2020.06.29
- International Announcement: WO2021/002648A 2021.01.07
- Date entered country: 2021-03-25
- Main IPC: G03H1/02
- IPC: G03H1/02 ; C08F2/50 ; C08F220/20 ; C08F283/12 ; G03F7/032

Abstract:
The present disclosure relates to a photopolymer composition including a polymer matrix or a precursor thereof having a predetermined chemical structure; a photoreactive monomer; and a photoinitiator, a hologram recording medium, an optical element and a holographic recording method using the same.
Public/Granted literature
- US20210340302A1 PHOTOPOLYMER COMPOSITION Public/Granted day:2021-11-04
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