Invention Grant
- Patent Title: Light source intensity control systems and methods for improved light scattering polarimetry measurements
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Application No.: US17709792Application Date: 2022-03-31
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Publication No.: US11860090B2Publication Date: 2024-01-02
- Inventor: Ryan Claude Andrews , Pierre Michel Bouzi , William John Furnas , Jacob Immerman , Jeremiah Robert Jacobson , Katherine Anne Lindberg , Evan Lewis Olson , Nathaniel David Wetmore
- Applicant: CORNING INCORPORATED
- Applicant Address: US NY Corning
- Assignee: CORNING INCORPORATED
- Current Assignee: CORNING INCORPORATED
- Current Assignee Address: US NY Corning
- Agent Timothy Schaeberle
- Main IPC: G01N21/47
- IPC: G01N21/47 ; G01J4/00 ; G01J4/04

Abstract:
Systems and methods of performing a stress measurement of a chemically strengthened glass using a light-scattering polarimetry system include adjusting the intensity of a light beam from a light source in an illumination system using a rotatable half-wave plate and a first polarizer operably disposed between the light source and a rotating light diffuser that has a rotation time tR. The first polarizer is aligned with a second polarizer in a downstream optical compensator to have matching polarization directions by rotating the rotatable half-wave plate to a position where the exposure time tE falls within an exposure range tR≤tE. The method also includes performing an exposure using the exposure time tE to obtain the stress measurement. One or both of the half-wave plate and first polarizer can be tilted to avoid deleterious back-reflected light from entering the light source.
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