Invention Grant
- Patent Title: Accuracy improvements in optical metrology
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Application No.: US17179379Application Date: 2021-02-18
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Publication No.: US11862522B2Publication Date: 2024-01-02
- Inventor: Barak Bringoltz , Evgeni Gurevich , Ido Adam , Yoel Feler , Dror Alumot , Yuval Lamhot , Noga Sella , Yaron De Leeuw , Tal Yaziv , Eltsafon Ashwal-Island , Lilach Saltoun , Tom Leviant
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Hodgson Russ LLP
- Main IPC: H01L21/66
- IPC: H01L21/66 ; G03F7/00 ; G03F9/00

Abstract:
Methods, metrology modules and target designs are provided, which improve the accuracy of metrology measurements. Methods provide flexible handling of multiple measurement recipes and setups and enable relating them to landscape features that indicate their relation to resonance regions and to flat regions. Clustering of recipes, self-consistency tests, common processing of aggregated measurements, noise reduction, cluster analysis, detailed analysis of the landscape and targets with skewed cells are employed separately or in combination to provide cumulative improvements of measurement accuracy.
Public/Granted literature
- US20210175132A1 ACCURACY IMPROVEMENTS IN OPTICAL METROLOGY Public/Granted day:2021-06-10
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