发明授权
- 专利标题: Thin film transistor substrate, display apparatus and method of manufacturing the same
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申请号: US17571895申请日: 2022-01-10
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公开(公告)号: US11864423B2公开(公告)日: 2024-01-02
- 发明人: Thanh Tien Nguyen , Meejae Kang , Yongsu Lee , Sanggun Choi
- 申请人: Samsung Display Co., Ltd.
- 申请人地址: KR Yongin-si
- 专利权人: Samsung Display Co., Ltd.
- 当前专利权人: Samsung Display Co., Ltd.
- 当前专利权人地址: KR Yongin-si
- 代理机构: Innovation Counsel LLP
- 优先权: KR 20190033800 2019.03.25
- 分案原申请号: US16737653 2020.01.08
- 主分类号: H01L27/14
- IPC分类号: H01L27/14 ; H10K59/121 ; H01L27/12 ; H01L29/786
摘要:
A thin film transistor substrate includes: a substrate, a first electrode disposed on the substrate, a bank disposed on the substrate and having an inclined surface inclined at an angle with respect to the substrate, a second electrode disposed on the bank, an active pattern electrically connected to the first electrode and the second electrode, disposed on the inclined surface, and including a first conductive region and a second conductive region in which impurities are doped, and a channel region between the first conductive region and the second conductive region, and a gate electrode overlapping at least a portion of the channel region of the active pattern. The inclined surface extends in a first direction in a plan view. The first conductive region, the channel region, and the second conductive region are sequentially disposed on the inclined surface along a second direction that crosses the first direction.
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