- 专利标题： Plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction coating for deposition of thin film coatings and modification of surfaces
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申请号： US16933146申请日： 2020-07-20
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公开(公告)号： US11875976B2公开(公告)日： 2024-01-16
- 发明人: John Chambers , Peter Maschwitz , Yuping Lin , Herb Johnson
- 申请人： AGC FLAT GLASS NORTH AMERICA, INC. , AGC GLASS EUROPE , ASAHI GLASS CO., LTD.
- 申请人地址： US GA Alpharetta
- 专利权人： AGC FLAT GLASS NORTH AMERICA, INC.,AGC GLASS EUROPE,ASAHI GLASS CO., LTD.
- 当前专利权人： AGC FLAT GLASS NORTH AMERICA, INC.,AGC GLASS EUROPE,ASAHI GLASS CO., LTD.
- 当前专利权人地址： US GA Alpharetta; BE Louvain-la-Neuve; JP Tokyo
- 代理机构： Rothwell, Figg, Ernst & Manbeck, P.C.
- 分案原申请号： US15532845
- 主分类号： H01J37/32
- IPC分类号： H01J37/32 ; C03C17/245 ; C23C16/50
摘要：
The present invention relates generally to a plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction for deposition of thin film coatings and modification of surfaces. More particularly, the present invention relates to a plasma source comprising one or more plasma-generating electrodes, wherein a macro-particle reduction coating is deposited on at least a portion of the plasma-generating surfaces of the one or more electrodes to shield the plasma-generating surfaces of the electrodes from erosion by the produced plasma and to resist the formation of particulate matter, thus enhancing the performance and extending the service life of the plasma source.
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