Invention Grant
- Patent Title: Method for transferring a useful layer onto a support substrate
-
Application No.: US17439300Application Date: 2020-02-26
-
Publication No.: US11881429B2Publication Date: 2024-01-23
- Inventor: Didier Landru , Oleg Kononchuk , Nadia Ben Mohamed
- Applicant: Soitec
- Applicant Address: FR Bernin
- Assignee: SOITEC
- Current Assignee: SOITEC
- Current Assignee Address: FR Bernin
- Agency: TraskBritt
- Priority: FR 02671 2019.03.15
- International Application: PCT/FR2020/050368 2020.02.26
- International Announcement: WO2020/188168A 2020.09.24
- Date entered country: 2021-09-14
- Main IPC: H01L21/762
- IPC: H01L21/762 ; H01L21/265 ; H01L21/78

Abstract:
A method for transferring a useful layer to a carrier substrate, includes the following steps: a) providing a donor substrate including a buried weakened plane; b) providing a carrier substrate; c) joining the donor substrate, by its front face, to the carrier substrate along a bonding interface so as to form a bonded structure; d) annealing the bonded structure in order to apply a weakening thermal budget thereto and to bring the buried weakened plane to a defined level of weakening; and e) initiating a splitting wave in the weakened plane by applying a stress to the bonded structure, the splitting wave self-propagating along the weakened plane to result in the useful layer being transferred to the carrier substrate. The splitting wave is initiated when the bonded structure is subjected to a temperature between 150° C. and 250° C.
Public/Granted literature
- US20220157651A1 METHOD FOR TRANSFERRING A USEFUL LAYER ONTO A SUPPORT SUBSTRATE Public/Granted day:2022-05-19
Information query
IPC分类: