• Patent Title: Method for transferring a useful layer onto a support substrate
  • Application No.: US17439300
    Application Date: 2020-02-26
  • Publication No.: US11881429B2
    Publication Date: 2024-01-23
  • Inventor: Didier LandruOleg KononchukNadia Ben Mohamed
  • Applicant: Soitec
  • Applicant Address: FR Bernin
  • Assignee: SOITEC
  • Current Assignee: SOITEC
  • Current Assignee Address: FR Bernin
  • Agency: TraskBritt
  • Priority: FR 02671 2019.03.15
  • International Application: PCT/FR2020/050368 2020.02.26
  • International Announcement: WO2020/188168A 2020.09.24
  • Date entered country: 2021-09-14
  • Main IPC: H01L21/762
  • IPC: H01L21/762 H01L21/265 H01L21/78
Method for transferring a useful layer onto a support substrate
Abstract:
A method for transferring a useful layer to a carrier substrate, includes the following steps: a) providing a donor substrate including a buried weakened plane; b) providing a carrier substrate; c) joining the donor substrate, by its front face, to the carrier substrate along a bonding interface so as to form a bonded structure; d) annealing the bonded structure in order to apply a weakening thermal budget thereto and to bring the buried weakened plane to a defined level of weakening; and e) initiating a splitting wave in the weakened plane by applying a stress to the bonded structure, the splitting wave self-propagating along the weakened plane to result in the useful layer being transferred to the carrier substrate. The splitting wave is initiated when the bonded structure is subjected to a temperature between 150° C. and 250° C.
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