Invention Grant
- Patent Title: Projection system for reducing light diffraction
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Application No.: US16642763Application Date: 2017-12-06
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Publication No.: US11906887B2Publication Date: 2024-02-20
- Inventor: Fei Hu , Zuqiang Guo , Peng Du , Yi Li
- Applicant: APPOTRONICS CORPORATION LIMITED
- Applicant Address: CN Shenzhen
- Assignee: APPOTRONICS CORPORATION LIMITED
- Current Assignee: APPOTRONICS CORPORATION LIMITED
- Current Assignee Address: CN Shenzhen
- Agency: MARSHALL, GERSTEIN & BORUN LLP
- Agent Michael P. Furmanek
- Priority: CN 1730406193.5 2017.08.30
- International Application: PCT/CN2017/114739 2017.12.06
- International Announcement: WO2019/041622A 2019.03.07
- Date entered country: 2020-12-03
- Main IPC: G03B21/00
- IPC: G03B21/00 ; G03B21/14 ; G03B21/20 ; H04N9/31 ; H04N19/00

Abstract:
A projection system, comprising a light modulation device, a light source system and a light offset device. The light source system is used for emitting one or more illumination sub-beams. The light modulation device is used for modulating illumination light according to image data to form image light, the image light being used for displaying an image corresponding to the image data. The light offset device is used for transferring one illumination sub-beam to each zone of a micro-mirror unit by means of a time sequence such that the micro-mirror unit modulates the illumination sub-beam by means of a time sequence to form image light of a pixel corresponding to each zone, wherein each zone corresponds to one pixel of an image.
Public/Granted literature
- US20210084266A1 PROEJCTION SYSTEM Public/Granted day:2021-03-18
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