Invention Grant
- Patent Title: Metrology method and associated metrology and lithographic apparatuses
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Application No.: US17565422Application Date: 2021-12-29
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Publication No.: US11906906B2Publication Date: 2024-02-20
- Inventor: Sebastianus Adrianus Goorden , Simon Reinald Huisman , Arjan Johannes Anton Beukman
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: FINNEGAN, HENDERSON, FARABOW, GARRETT & DUNNER, LLP
- Priority: EP 183776 2019.07.02
- Main IPC: G03F7/00
- IPC: G03F7/00

Abstract:
Disclosed is a method of metrology comprising using measurement illumination to measure a target, said measurement illumination comprising a plurality of illumination conditions. The method comprises performing a first measurement capture with a first subset of said plurality of illumination conditions, e.g., each comprising a positive weighting, to obtain a first parameter value and performing a second measurement capture with a second subset of said plurality of illumination conditions, e.g., each comprising a negative weighting, to obtain a second parameter value. An optimized parameter value is determined as a weighted combination of at least the first parameter value and the second parameter value.
Public/Granted literature
- US20220121128A1 METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES Public/Granted day:2022-04-21
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