发明授权
- 专利标题: Monolithic metal-insulator transition device and method for manufacturing the same
-
申请号: US17499736申请日: 2021-10-12
-
公开(公告)号: US11908931B2公开(公告)日: 2024-02-20
- 发明人: Tae Moon Roh , Hyun-Tak Kim , Sun Ae Kim
- 申请人: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
- 申请人地址: KR Daejeon
- 专利权人: Electronics and Telecommunications Research Institute
- 当前专利权人: Electronics and Telecommunications Research Institute
- 当前专利权人地址: KR Daejeon
- 代理机构: Rabin & Berdo, P.C.
- 优先权: KR 20200131370 2020.10.12 KR 20210133941 2021.10.08
- 主分类号: H01L29/78
- IPC分类号: H01L29/78 ; H10N99/00
摘要:
Provided is a monolithic metal-insulator transition device. The monolithic metal-insulator transition device includes a substrate including a driving region and a switching region, first and second source/drain regions on the driving region, a gate electrode between the first and second source/drain regions, an inlet well region formed adjacent to an upper surface of the substrate on the switching region, a control well region having a different conductivity type from the inlet well region between the inlet well region and a lower surface of the substrate, a first wiring electrically connecting the first source/drain region and the control well region, and a second wiring electrically connecting the second source/drain region and the inlet well region.
公开/授权文献
信息查询
IPC分类: