- 专利标题: Method for forming package structure with lid
-
申请号: US17679372申请日: 2022-02-24
-
公开(公告)号: US11915992B2公开(公告)日: 2024-02-27
- 发明人: Shin-Puu Jeng , Po-Yao Lin , Feng-Cheng Hsu , Shuo-Mao Chen , Chin-Hua Wang
- 申请人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 申请人地址: TW Hsinchu
- 专利权人: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- 当前专利权人: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- 当前专利权人地址: TW Hsinchu
- 代理机构: McClure, Qualey & Rodack, LLP
- 分案原申请号: US16182750 2018.11.07
- 主分类号: H01L23/367
- IPC分类号: H01L23/367 ; H01L25/18 ; H01L21/48 ; H01L21/56 ; H01L25/00
摘要:
A method for forming a package structure is provided, including forming an interconnect structure over a carrier substrate and forming a semiconductor die over a first side of the interconnect structure. A removable film is formed over the semiconductor die. The method includes forming a first stacked die package structure over the first side of the interconnect structure. A top surface of the removable film is higher than a top surface of the first stacked die package structure. The method includes forming a package layer, removing a portion of the package layer to expose a portion of the removable film, removing the removable film to form a recess, forming a lid structure over the semiconductor die and the first stacked die package structure. The lid structure has a main portion and a protruding portion disposed in the recess and extending from the main portion.
公开/授权文献
- US20220181232A1 METHOD FOR FORMING PACKAGE STRUCTURE WITH LID 公开/授权日:2022-06-09
信息查询
IPC分类: