Invention Grant
- Patent Title: Method for manufacturing multilayer substrate and multilayer substrate
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Application No.: US17575717Application Date: 2022-01-14
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Publication No.: US11924980B2Publication Date: 2024-03-05
- Inventor: Yusuke Kamitsubo , Tomohiro Furumura
- Applicant: Murata Manufacturing Co., Ltd.
- Applicant Address: JP Nagaokakyo
- Assignee: MURATA MANUFACTURING CO., LTD.
- Current Assignee: MURATA MANUFACTURING CO., LTD.
- Current Assignee Address: JP Kyoto
- Agency: Keating & Bennett, LLP
- Priority: JP 19146236 2019.08.08 JP 20063451 2020.03.31
- Main IPC: H05K1/02
- IPC: H05K1/02 ; H05K1/03 ; H05K3/46

Abstract:
A method for manufacturing a multilayer substrate including first and second insulating resin base material layers including different materials, includes configuring a conductor film-attached insulating resin base material with a conductor film on the first insulating resin base material layer, or a second conductor film-attached insulating resin base material with a conductor film on a main surface of the first insulating resin base material layer including a main surface of a stacked body including at least the first insulating resin base material layer, and stacking the first or second conductor film-attached insulating resin base material and another base material layer such that the conductor film is in contact with the second insulating resin base material layer. An adhesion strength of the first insulating resin base material layer to the conductor film is higher than an adhesion strength of the second insulating resin base material layer to the conductor film.
Public/Granted literature
- US20220141966A1 METHOD FOR MANUFACTURING MULTILAYER SUBSTRATE AND MULTILAYER SUBSTRATE Public/Granted day:2022-05-05
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