- 专利标题: Semiconductor device
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申请号: US17124808申请日: 2020-12-17
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公开(公告)号: US11925029B2公开(公告)日: 2024-03-05
- 发明人: Takamasa Ito , Hiroshi Matsumoto
- 申请人: Kioxia Corporation
- 申请人地址: JP Tokyo
- 专利权人: Kioxia Corporation
- 当前专利权人: Kioxia Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP 20147055 2020.09.01
- 主分类号: H10B43/50
- IPC分类号: H10B43/50 ; H10B43/10 ; H10B43/27 ; H10B43/40
摘要:
A semiconductor device includes a semiconductor substrate on which a first insulation film is provided. A first conductive film is on the first insulation film. First electrode films are on the first conductive film and stacked. A charge accumulation member is between one of the first electrode films and the semiconductor member. The first conductive film includes a main body arranged below the first electrode films and an outer peripheral portion provided in an outer periphery of the main body to be apart from the main body. First and second slits are alternately provided in the outer peripheral portion, and extend along the outer periphery of the main body. The first and second slits are apart from each other as viewed in the stacking direction, and partly overlap each other as viewed in a first direction directed from the main body toward the outer peripheral portion.
公开/授权文献
- US20220068948A1 SEMICONDUCTOR DEVICE 公开/授权日:2022-03-03
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