Invention Grant
- Patent Title: Laser MEMS projection system with single-axis and dual axis beam deflectors
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Application No.: US17551570Application Date: 2021-12-15
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Publication No.: US11927746B1Publication Date: 2024-03-12
- Inventor: Veljko Milanovic , Abhishek Kasturi
- Applicant: Mirrorcle Technologies, Inc.
- Applicant Address: US CA Richmond
- Assignee: MIRRORCLE TECHNOLOGIES, INC.
- Current Assignee: MIRRORCLE TECHNOLOGIES, INC.
- Current Assignee Address: US CA Richmond
- Agency: JDI Patent
- Agent Joshua D. Isenberg; Robert Pullman
- The original application number of the division: US15202476 2016.07.05
- Main IPC: G02B26/10
- IPC: G02B26/10 ; G02B26/08 ; G02B27/01 ; G02B27/14

Abstract:
An apparatus, comprising, a scan module having one or more laser sources that generate one or more initial laser beams and two or more beam deflectors that deflect the one or more initial laser beams. A beam optic is configured to substantially collimate the one or more initial laser beams to produce one or more collimated laser beams. One or more beam deflector controllers are configured to control an angle of beam deflection from each beam deflector. Relay optics between the two or more beam deflectors are configured to image each sequential beam deflector in an optical chain onto the subsequent beam deflector in such a manner that the beam deflecting from a last beam deflector in the optical chain contains a combination or superposition of all the beam deflections of the beam deflectors in the sequence, and maintains a beam divergence of the one or more collimated beams. A first beam deflector of the two or more beam deflectors is configured to scan about a single axis and a second beam deflector of the two or more beam deflectors is configured to scan in a quasi-static mode about two orthogonal axes.
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