发明授权
- 专利标题: Semiconductor device and method for manufacturing the same, and semiconductor package
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申请号: US17461971申请日: 2021-08-30
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公开(公告)号: US11948920B2公开(公告)日: 2024-04-02
- 发明人: I-Chun Hsu , Yan-Zuo Tsai , Chia-Yin Chen , Yang-Chih Hsueh , Yung-Chi Lin , Tsang-Jiuh Wu , Wen-Chih Chiou
- 申请人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 申请人地址: TW Hsinchu
- 专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址: TW Hsinchu
- 代理机构: JCIPRNET
- 主分类号: H01L25/18
- IPC分类号: H01L25/18 ; H01L25/00 ; H01L25/065
摘要:
Provided are a semiconductor device and a method for manufacturing the same, and a semiconductor package. The semiconductor device includes a die stack and a cap substrate. The die stack includes a first die, second dies stacked on the first die, and a third die stacked on the second dies. The first die includes first through semiconductor vias. Each of the second dies include second through semiconductor vias. The third die includes third through semiconductor vias. The cap substrate is disposed on the third die of the die stack. A sum of a thickness of the third die and a thickness of the cap substrate ranges from about 50 μm to about 80 μm.
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