- 专利标题: Electrode slurry-discharging shim allowing even coating, and coating die comprising same
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申请号: US17639774申请日: 2020-12-18
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公开(公告)号: US11951508B2公开(公告)日: 2024-04-09
- 发明人: Jong Hwan Choi , In Seong Kim , Min Cheol Choi
- 申请人: LG Energy Solution, Ltd.
- 申请人地址: KR Seoul
- 专利权人: LG Energy Solution, Ltd.
- 当前专利权人: LG Energy Solution, Ltd.
- 当前专利权人地址: KR Seoul
- 代理机构: Lerner David LLP
- 优先权: KR 20190175849 2019.12.27
- 国际申请: PCT/KR2020/018625 2020.12.18
- 国际公布: WO2021/132992A 2021.07.01
- 进入国家日期: 2022-03-02
- 主分类号: B05C5/02
- IPC分类号: B05C5/02 ; B05C13/02 ; H01M4/04
摘要:
The present technology relates to an electrode slurry-discharging shim, and a coating die comprising same, the present technology allowing superbly even coating to be assured even when the electrode slurry coating is at a high load level. In one example, the present technology provides a coating shim for electrode slurry discharge according to the present invention having a step portion configured to be formed at an end of an electrode slurry discharge flow path and to increase a width of the discharge flow path, and the step portion is formed at opposite sides in a width direction of the electrode slurry discharge flow path.
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