Invention Grant
- Patent Title: Semiconductor device
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Application No.: US17203759Application Date: 2021-03-17
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Publication No.: US11961854B2Publication Date: 2024-04-16
- Inventor: Sywe Neng Lee
- Applicant: Sywe Neng Lee
- Applicant Address: TW Taipei
- Assignee: Sywe Neng Lee
- Current Assignee: Sywe Neng Lee
- Current Assignee Address: TW Taipei
- Agency: JCIPRNET
- Priority: TW 9146726 2020.12.29 CN 2110180113.4 2021.02.08
- Main IPC: H01L27/146
- IPC: H01L27/146

Abstract:
A semiconductor device, including a dielectric layer and a semiconductor substrate, is provided. The dielectric layer has a convexity or a concavity. The semiconductor substrate includes a first type semiconductor layer and a second type semiconductor layer sequentially stacked on the dielectric layer. The first type semiconductor layer is disposed on the convexity or the concavity. A top surface and a bottom surface of the first type semiconductor layer are protruded according to the convexity or recessed according to the concavity. A bottom surface of the second type semiconductor layer is protruded according to the convexity or recessed according to the concavity.
Public/Granted literature
- US20220208813A1 SEMICONDUCTOR DEVICE Public/Granted day:2022-06-30
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