Invention Grant
- Patent Title: Method for manufacturing side wire for substrate and substrate structure
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Application No.: US17256084Application Date: 2020-04-10
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Publication No.: US11984546B2Publication Date: 2024-05-14
- Inventor: Yonglian Qi , Lianjie Qu , Shan Zhang , Hebin Zhao , Xiaoling Xu , Guangdong Shi
- Applicant: BEIJING BOE DISPLAY TECHNOLOGY CO., LTD. , BOE TECHNOLOGY GROUP CO., LTD.
- Applicant Address: CN Beijing
- Assignee: BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.,BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee: BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.,BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee Address: CN Beijing; CN Beijing
- Agency: Nath, Goldberg & Meyer
- Agent Joshua B. Goldberg
- Priority: CN 1910285864.5 2019.04.10
- International Application: PCT/CN2020/084176 2020.04.10
- International Announcement: WO2020/207465A 2020.10.15
- Date entered country: 2020-12-24
- Main IPC: H01L33/62
- IPC: H01L33/62 ; H05K1/02 ; H05K3/06

Abstract:
A method for manufacturing a side wire for a substrate and a substrate structure are provided. The method includes: forming a plurality of first pattern structures on a side surface of the substrate, wherein a gap between any adjacent two of the plurality of first pattern structures connects a top surface and a bottom surface of the substrate to each other; forming a conductive material film covering the side surface of the substrate; and removing the plurality of first pattern structures and a portion of the conductive material film that is attached on the plurality of first pattern structures, and maintaining a portion of the conductive material film that is located between any adjacent two of the plurality of first pattern structures as the side wire.
Public/Granted literature
- US20210193896A1 METHOD FOR MANUFACTURING SIDE WIRE FOR SUBSTRATE AND SUBSTRATE STRUCTURE Public/Granted day:2021-06-24
Information query
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