- 专利标题: Method for manufacturing package structure
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申请号: US18077778申请日: 2022-12-08
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公开(公告)号: US12021037B2公开(公告)日: 2024-06-25
- 发明人: Yi-Da Tsai , Cheng-Ping Lin , Wei-Hung Lin , Chih-Wei Lin , Ming-Da Cheng , Ching-Hua Hsieh , Chung-Shi Liu
- 申请人: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- 申请人地址: TW Hsinchu
- 专利权人: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- 当前专利权人: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- 当前专利权人地址: TW Hsinchu
- 代理机构: Birch, Stewart, Kolasch & Birch, LLP
- 分案原申请号: US17121089 2020.12.14
- 主分类号: H01L23/538
- IPC分类号: H01L23/538 ; H01L21/48 ; H01L21/56 ; H01L21/683 ; H01L23/00 ; H01L23/29 ; H01L23/31 ; H01L25/00 ; H01L25/065
摘要:
Package structures and methods for forming the same are provided. The method includes forming a passivation layer having an opening and forming a first seed layer in the opening. The method further includes filling the opening with a conductive layer over the first seed layer and bonding an integrated circuit die to the conductive layer over a first side of the passivation layer. The method further includes removing a portion of the first seed layer to expose a top surface of the conductive layer and to partially expose a first sidewall of the passivation layer from a second side of the passivation layer and forming a second seed layer over the top surface of the conductive layer and over the first sidewall of the passivation layer.
公开/授权文献
- US20230098830A1 METHOD FOR MANUFACTURING PACKAGE STRUCTURE 公开/授权日:2023-03-30
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