Invention Grant
- Patent Title: Reactor system and method to reduce residue buildup during a film deposition process
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Application No.: US17840960Application Date: 2022-06-15
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Publication No.: US12043899B2Publication Date: 2024-07-23
- Inventor: Hyeongeu Kim , Tom Kirschenheiter , Eric Hill , Mark Hawkins , Loren Jacobs
- Applicant: ASM IP Holding B.V.
- Applicant Address: NL Almere
- Assignee: ASM IP Holding B.V.
- Current Assignee: ASM IP Holding B.V.
- Current Assignee Address: NL Almere
- Agency: Snell & Wilmer L.L.P.
- The original application number of the division: US15402993 2017.01.10
- Main IPC: C23C16/52
- IPC: C23C16/52 ; C23C16/24 ; C23C16/44 ; C23C16/458
Abstract:
A system and method for depositing a film within a reaction chamber are disclosed. An exemplary system includes a temperature measurement device, such as a pyrometer, to measure an exterior wall surface of the reaction chamber. A temperature of the exterior wall surface can be controlled to mitigate cleaning or etching of an interior wall surface of the reaction chamber.
Public/Granted literature
- US20220307139A1 REACTOR SYSTEM AND METHOD TO REDUCE RESIDUE BUILDUP DURING A FILM DEPOSITION PROCESS Public/Granted day:2022-09-29
Information query
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