- 专利标题: Filtration and purification device
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申请号: US17386475申请日: 2021-07-27
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公开(公告)号: US12044235B2公开(公告)日: 2024-07-23
- 发明人: Hao-Jan Mou , Ching-Sung Lin , Chin-Chuan Wu , Chi-Feng Huang , Yung-Lung Han , Chun-Yi Kuo , Chin-Wen Hsieh
- 申请人: MICROJET TECHNOLOGY CO., LTD.
- 申请人地址: TW Hsinchu
- 专利权人: MICROJET TECHNOLOGY CO., LTD.
- 当前专利权人: MICROJET TECHNOLOGY CO., LTD.
- 当前专利权人地址: TW Hsinchu
- 代理机构: Birch, Stewart, Kolasch & Birch, LLP
- 优先权: TW 9129790 2020.08.31
- 主分类号: F04B53/20
- IPC分类号: F04B53/20 ; F04B43/04
摘要:
A filtration and purification device includes a main body and one or more filtration passage layer. A plurality of purification chambers is disposed in the filtration passage layer. Each of the purification chambers has a flow-guiding unit, a filtration unit, a gas sensor, and an outlet valve. The flow-guiding unit introduces the gas into the purification chamber, the filtration unit filters the gas, and the gas sensor determines that if the filtered gas reaches a threshold for breathing so as to determine to open the outlet valve to discharge the gas out of the filtration and purification device.
公开/授权文献
- US20220065244A1 FILTRATION AND PURIFICATION DEVICE 公开/授权日:2022-03-03
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