Invention Grant
- Patent Title: Photopolymerizable block polymers and methods of producing and using the same
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Application No.: US17728900Application Date: 2022-04-25
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Publication No.: US12049528B2Publication Date: 2024-07-30
- Inventor: Umesh Upendra Choudhary , Jessica Kalay Su , Michael Christopher Cole , Jennifer Marie Chavez
- Applicant: Align Technology, Inc.
- Applicant Address: US CA San Jose
- Assignee: ALIGN TECHNOLOGY, INC.
- Current Assignee: ALIGN TECHNOLOGY, INC.
- Current Assignee Address: US CA San Jose
- Agency: Seed IP Law Group LLP
- Main IPC: C08F2/46
- IPC: C08F2/46 ; C08F2/50 ; C08F220/12 ; C08F220/30 ; C08G61/04 ; A61C7/00 ; B33Y70/00 ; B33Y80/00
Abstract:
Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, and telechelic block polymers and methods of using such polymers in curable compositions to produce medical devices such as orthodontic appliances comprising the polymeric compositions comprising the telechelic block polymers.
Public/Granted literature
- US20220363792A1 PHOTOPOLYMERIZABLE BLOCK POLYMERS AND METHODS OF PRODUCING AND USING THE SAME Public/Granted day:2022-11-17
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