Invention Grant
- Patent Title: MRAM cell embedded in a metal layer
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Application No.: US17513108Application Date: 2021-10-28
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Publication No.: US12058942B2Publication Date: 2024-08-06
- Inventor: Ashim Dutta , Chih-Chao Yang
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agent Gavin Giraud
- Main IPC: H10N50/80
- IPC: H10N50/80 ; H10B61/00 ; H10N50/01

Abstract:
Embodiments disclosed herein include a semiconductor structure. The semiconductor structure may include a magnetoresistive random access memory (MRAM) cell with a memory array landing pad contacting a first bottom metal level contact and an MRAM pillar electrically connected to the memory array landing pad. The semiconductor structure may also include a logic interconnect contacting a second bottom metal level contact and a dielectric cap above the MRAM cell and the logic interconnect. The MRAM cell and logic interconnect may be electrically connected to a top metal level through the dielectric cap.
Public/Granted literature
- US20230136650A1 MRAM CELL EMBEDDED IN A METAL LAYER Public/Granted day:2023-05-04
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