Invention Grant
- Patent Title: Method and apparatus for predicting aberrations in a projection system
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Application No.: US17438314Application Date: 2020-02-10
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Publication No.: US12078938B2Publication Date: 2024-09-03
- Inventor: Mhamed Akhssay , Laurentius Johannes Adrianus Van Bokhoven
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP 162154 2019.03.12 EP 164607 2019.03.22
- International Application: PCT/EP2020/053292 2020.02.10
- International Announcement: WO2020/182386A 2020.09.17
- Date entered country: 2021-09-10
- Main IPC: G03F7/00
- IPC: G03F7/00
Abstract:
A method of predicting thermally induced aberrations of a projection system for projecting a radiation beam, the method comprising: calculating a change in temperature of the projection system from a power of the radiation beam output from the projection system using a dynamic linear function; and calculating the thermally induced aberrations from the calculated change in temperature using a static non-linear function.
Public/Granted literature
- US20220187715A1 A METHOD AND APPARATUS FOR PREDICTING ABERRATIONS IN A PROJECTION SYSTEM Public/Granted day:2022-06-16
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