- 专利标题: Silicon carbide-based lateral PN junction extreme ultraviolet detector based on selective-area ion implantation, and preparation method thereof
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申请号: US18588391申请日: 2024-02-27
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公开(公告)号: US12080821B2公开(公告)日: 2024-09-03
- 发明人: Hai Lu , Dong Zhou , Weizong Xu
- 申请人: NANJING UNIVERSITY
- 申请人地址: CN Nanjing
- 专利权人: NANJING UNIVERSITY
- 当前专利权人: NANJING UNIVERSITY
- 当前专利权人地址: CN Nanjing
- 代理商 Nitin Kaushik
- 优先权: CN 2111196401.5 2021.10.14
- 主分类号: H01L31/103
- IPC分类号: H01L31/103 ; H01L31/0224 ; H01L31/0312 ; H01L31/18
摘要:
The present invention discloses a novel silicon carbide-based lateral PN junction extreme ultraviolet detector with enhanced detection performance based on selective-area ion implantation, including an N-type ohmic contact lower electrode, an N-type substrate and a lightly-doped epitaxial layer which are connected sequentially from bottom to top, where the lightly-doped epitaxial layer is an N-type lightly-doped epitaxial layer or a P-type lightly-doped epitaxial layer; in a case that the lightly-doped epitaxial layer is an N-type or P-type lightly-doped epitaxial layer, a P-type or N-type well region is formed on the surface of the N-type or P-type lightly-doped epitaxial layer through the selective-area ion implantation, a P-type or N-type ohmic contact upper electrode is arranged on the P-type or N-type well region, and the P-type or N-type ohmic contact upper electrode is provided with a metal conductive electrode along its periphery.
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