Invention Grant
- Patent Title: Resistive material, method of manufacturing resistive material, and resistor for detecting electric current
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Application No.: US17754031Application Date: 2020-08-06
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Publication No.: US12087480B2Publication Date: 2024-09-10
- Inventor: Reina Kaneko , Yoshitaka Kumeda , Tadahiko Yoshioka
- Applicant: KOA Corporation
- Applicant Address: JP Nagano
- Assignee: KOA Corporation
- Current Assignee: KOA Corporation
- Current Assignee Address: JP Nagano
- Agency: Honigman LLP
- Priority: JP 19174434 2019.09.25
- International Application: PCT/JP2020/030241 2020.08.06
- International Announcement: WO2021/059772A 2021.04.01
- Date entered country: 2022-03-22
- Main IPC: H01C7/13
- IPC: H01C7/13 ; H01C17/02 ; H01C17/065
Abstract:
The resistive material contains copper and manganese, an oxide film of manganese being formed on a surface of the resistive material.
Public/Granted literature
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