Invention Grant
- Patent Title: Composition for dissolving abrasive particles and cleaning method using the same
-
Application No.: US17516668Application Date: 2021-11-01
-
Publication No.: US12091636B2Publication Date: 2024-09-17
- Inventor: Kyong Jin Jung , Ga Young Jung , Young Ho Yun , Kun Hee Park , Young Gon Kim , Yong Ho Jeong
- Applicant: KCTECH CO., LTD.
- Applicant Address: KR Anseong-si
- Assignee: KCTECH CO., LTD.
- Current Assignee: KCTECH CO., LTD.
- Current Assignee Address: KR Gyeonggi-do
- Agency: JCIPRNET
- Priority: KR 20200147813 2020.11.06
- Main IPC: C11D1/00
- IPC: C11D1/00 ; C09G1/02 ; C09K3/14 ; C11D1/14 ; H01L21/304
Abstract:
A composition for dissolving abrasive particles, and a cleaning method using the composition are provided. The composition includes a sulfur-containing organic acid, a fluorine ion-containing compound, and a solvent, and a turbidity change rate (%) measured at 60° C. for 15 minutes may be in a range of −80 to −99.
Public/Granted literature
- US20220145216A1 COMPOSITION FOR DISSOLVING ABRASIVE PARTICLES AND CLEANING METHOD USING THE SAME Public/Granted day:2022-05-12
Information query
