Invention Grant
- Patent Title: Nonvolatile memory device, system including the same and method of fabricating the same
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Application No.: US18349017Application Date: 2023-07-07
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Publication No.: US12094846B2Publication Date: 2024-09-17
- Inventor: Jae Ho Ahn , Ji Won Kim , Sung-Min Hwang , Joon-Sung Lim , Suk Kang Sung
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Fish & Richardson P.C.
- Priority: KR 20200125854 2020.09.28
- Main IPC: H01L25/065
- IPC: H01L25/065 ; H01L21/768 ; H01L23/00 ; H01L23/535 ; H01L25/18 ; H10B41/27 ; H10B43/27

Abstract:
A nonvolatile memory device including a substrate extending in a first direction, a ground selection line extending in the first direction on the substrate, a plurality of word lines stacked sequentially on the ground selection line and extending in the first direction, a landing pad spaced apart from the ground selection line and the plurality of word lines in the first direction, a rear contact plug connected to a lower face of the landing pad and extending in a second direction intersecting the first direction, a front contact plug connected to an upper face of the landing pad opposite the lower face and extending in the second direction, an input/output pad electrically connected to the rear contact plug, and an upper bonding pad electrically connected to the front contact plug and connected to at least a part of a plurality of circuit elements of the nonvolatile memory device.
Public/Granted literature
- US20240014157A1 NONVOLATILE MEMORY DEVICE, SYSTEM INCLUDING THE SAME AND METHOD OF FABRICATING THE SAME Public/Granted day:2024-01-11
Information query
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