Invention Grant
- Patent Title: Method for manufacturing transparent electrode with low surface roughness
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Application No.: US18025629Application Date: 2022-07-15
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Publication No.: US12119138B2Publication Date: 2024-10-15
- Inventor: Dongdong Li , Wenyong Lai
- Applicant: Nanjing University of Posts and Telecommunications
- Applicant Address: CN Jiangsu
- Assignee: Nanjing University of Posts and Telecommunications
- Current Assignee: Nanjing University of Posts and Telecommunications
- Current Assignee Address: CN Jiangsu
- Agency: JCIPRNET
- Priority: CN 2111317938.2 2021.11.09
- International Application: PCT/CN2022/105865 2022.07.15
- International Announcement: WO2023/082686A 2023.05.19
- Date entered country: 2023-03-09
- Main IPC: H01M4/139
- IPC: H01M4/139 ; H01B5/14 ; H01B13/00 ; B82Y30/00

Abstract:
A method for manufacturing a transparent electrode with a low surface roughness, in particular a method for preparing a large-area, low-cost and patterned transparent electrode using the screen-printing technology, which focuses on solving the problem of a high roughness of a screen-printed pattern. First, a substrate is coated with a layer of a smooth conductive material, then screen printing is performed to obtain a conductive pattern, and finally, a layer of a surfactant-modified composite conductive material is applied and film transfer printing is performed to obtain a transparent electrode with a low surface roughness. The transparent electrode prepared by the method retains a smooth surface of the original substrate after peeling, which has a remarkably low surface roughness and a significantly increased success rate of film transfer printing, and can be directly applied to various photoelectric devices, such as solar batteries, LEDs, flat panel displays and electronic sensors.
Public/Granted literature
- US20240186034A1 METHOD FOR MANUFACTURING TRANSPARENT ELECTRODE WITH LOW SURFACE ROUGHNESS Public/Granted day:2024-06-06
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