- 专利标题: Semiconductor device and method for manufacturing semiconductor device
-
申请号: US17283936申请日: 2019-02-28
-
公开(公告)号: US12119314B2公开(公告)日: 2024-10-15
- 发明人: Nobuyoshi Kimoto , Tadatsugu Yamamoto
- 申请人: Mitsubishi Electric Corporation
- 申请人地址: JP Tokyo
- 专利权人: Mitsubishi Electric Corporation
- 当前专利权人: Mitsubishi Electric Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Studebaker & Brackett PC
- 国际申请: PCT/JP2019/007880 2019.02.28
- 国际公布: WO2020/174670A 2020.09.03
- 进入国家日期: 2021-04-08
- 主分类号: H01L23/00
- IPC分类号: H01L23/00
摘要:
A semiconductor device according to the present disclosure includes a semiconductor substrate, a first electrode provided on the semiconductor substrate, an insulating layer including a first part provided on an upper surface of the first electrode, a second electrode including a main portion and an eaves portion, the main portion being provided on the upper surface of the first electrode, the eaves portion extending over the first part and solder covering an upper surface of the main portion and a part of an upper surface of the eaves portion wherein the insulating layer includes a second part covering a part of the upper surface of the eaves portion, the part being closer to an end portion of the eaves portion than the part covered by the solder and a third part connecting the first part and the second part and covering the end portion of the eaves portion.
公开/授权文献
信息查询
IPC分类: