Invention Grant
- Patent Title: Wavelength selection filter, method of manufacturing wavelength selection filter, and display device
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Application No.: US17406925Application Date: 2021-08-19
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Publication No.: US12124062B2Publication Date: 2024-10-22
- Inventor: Masashi Kawashita , Yukari Oda , Yuki Yasu , Yoshiko Ishimaru
- Applicant: TOPPAN PRINTING CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: TOPPAN PRINTING CO., LTD.
- Current Assignee: TOPPAN PRINTING CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Foley & Lardner LLP
- Priority: JP 19033025 2019.02.26 JP 19033026 2019.02.26
- Main IPC: G02B5/20
- IPC: G02B5/20 ; G02B5/28 ; G02B27/12 ; H10K50/858

Abstract:
A wavelength selection filter includes a first high refractive index section with a thickness T1, a second high refractive index section with a thickness T2, a high refractive index layer with a refractive index n1, a projection-depression structure layer with a refractive index n2, a filling layer with a refractive index n3, a first high refractive index section with an area ratio R1, and a second high refractive index section with an area ratio R2. With n1>n2, n1>n3, and R1+R2>1, the value of T1×{n1×R1+n2×(1−R1)} is a first parameter, the value of T2×{n1×R2+n3×(1−R2)} is a second parameter, and the ratio of the second parameter to the first parameter is 0.7 or more and 1.3 or less.
Public/Granted literature
- US20210382215A1 WAVELENGTH SELECTION FILTER, METHOD OF MANUFACTURING WAVELENGTH SELECTION FILTER, AND DISPLAY DEVICE Public/Granted day:2021-12-09
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