Invention Grant
- Patent Title: Semiconductor device and method of manufacturing the same
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Application No.: US17738342Application Date: 2022-05-06
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Publication No.: US12125774B2Publication Date: 2024-10-22
- Inventor: Hisashi Shimura , Yoshiyasu Kuwabara
- Applicant: SUMITOMO ELECTRIC DEVICE INNOVATIONS, INC
- Applicant Address: JP Kanagawa
- Assignee: SUMITOMO ELECTRIC DEVICE INNOVATIONS, INC.
- Current Assignee: SUMITOMO ELECTRIC DEVICE INNOVATIONS, INC.
- Current Assignee Address: JP Kanagawa
- Agency: Smith, Gambrell & Russell, LLP
- Priority: JP 18103823 2018.05.30 JP 19035716 2019.02.28
- The original application number of the division: US16425369 2019.05.29
- Main IPC: H01L23/495
- IPC: H01L23/495 ; H01L21/56 ; H01L23/31 ; H01L29/267 ; H01L29/78

Abstract:
A semiconductor device includes a semiconductor chip in which a field effect transistor mainly containing GaN is formed on a surface of a SiC semiconductor substrate. The semiconductor device includes a metal base on which a back surface of the semiconductor chip is mounted through a conductive adhesive material containing Ag and a resin mold configured to seal the semiconductor chip. A metal having wettability lower than wettability of Au or Cu with respect to Ag is exposed in a region extending along an edge of the back surface.
Public/Granted literature
- US20220262710A1 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2022-08-18
Information query
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