Invention Grant
- Patent Title: Resin composition for imprinting
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Application No.: US17627051Application Date: 2020-07-13
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Publication No.: US12129392B2Publication Date: 2024-10-29
- Inventor: Yuki Sugiura , Yohei Uetsuki
- Applicant: NAGASE CHEMTEX CORPORATION
- Applicant Address: JP Osaka
- Assignee: Nagase ChemteX Corporation
- Current Assignee: Nagase ChemteX Corporation
- Current Assignee Address: JP Osaka
- Agency: HSML P.C.
- Priority: JP 19136038 2019.07.24
- International Application: PCT/JP2020/027278 2020.07.13
- International Announcement: WO2021/015044A 2021.01.28
- Date entered country: 2022-01-13
- Main IPC: C09D183/04
- IPC: C09D183/04 ; C08K3/22 ; C08K5/5419 ; C08L83/04 ; B29C59/02 ; B29K83/00 ; B29K105/16 ; B29K509/02

Abstract:
Provided is a resin composition for imprinting excellent in imprint properties and optical properties such as high refractive index and low haze. The invention relates to a resin composition for imprinting containing: (A) a polysiloxane resin represented by the following formula (1): (R1SiO3/2)a(R22SiO2/2)b(R33SiO1/2)c(SiO4/2)d wherein R1, R2, and R3 are each independently a hydrogen atom, a hydroxy group, an alkoxy group, a C1-C12 hydrocarbon group, or a C1-C12 substituent having one or more crosslinkable functional groups, with at least one of R1, R2, or R3 being a C1-C12 substituent having one or more crosslinkable functional groups, and when a plurality of R1s, R2s, or R3s are present, they may be different from one another; and a, b, c, and d are numbers satisfying the following conditions: 0.001≤a≤1.00, 0≤b≤0.999, 0≤c≤0.30, 0≤d≤0.30, and a+b+c+d=1.0; and (B) a fine particulate inorganic oxide, wherein the ratio by weight of the sum of the polysiloxane resin (A) and optionally an alkoxysilane compound and a curable resin to the fine particulate inorganic oxide (B) is 0.2 to 2.5.
Public/Granted literature
- US20220267638A1 RESIN COMPOSITION FOR IMPRINTING Public/Granted day:2022-08-25
Information query
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