Invention Grant
- Patent Title: Methods of tuning a model for a lithographic process and associated apparatuses
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Application No.: US17795058Application Date: 2021-01-11
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Publication No.: US12147161B2Publication Date: 2024-11-19
- Inventor: Mhamed Akhssay , Pierluigi Frisco
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Priority: EP20156986 20200212,EP20178091 20200603
- International Application: PCT/EP2021/050361 WO 20210111
- International Announcement: WO2021/160351 WO 20210819
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F7/00
Abstract:
A method at tuning a lithographic process for a particular patterning device. The method includes: obtaining wavefront data relating to an objective lens of a lithographic apparatus, the wavefront data measured subsequent to an exposure of a pattern on a substrate using the particular patterning device; determining a pattern specific wavefront contribution from the wavefront data and a wavefront reference, the pattern specific wavefront contribution relating to the patterning device; and tuning the lithographic process for the particular patterning device using the pattern specific wavefront contribution.
Public/Granted literature
- US20230084130A1 METHODS OF TUNING A MODEL FOR A LITHOGRAPHIC PROCESS AND ASSOCIATED APPARATUSES Public/Granted day:2023-03-16
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