Invention Grant
- Patent Title: Variable high throughput control field
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Application No.: US17583429Application Date: 2022-01-25
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Publication No.: US12149484B2Publication Date: 2024-11-19
- Inventor: Jiyang Bai , Xianbin Wang , Jung Hoon Suh , Yan Xin , Osama Aboul-Magd , Kwok Shum Au
- Applicant: HUAWEI TECHNOLOGIES CO., LTD.
- Applicant Address: CN Shenzhen
- Assignee: HUAWEI TECHNOLOGIES CO., LTD.
- Current Assignee: HUAWEI TECHNOLOGIES CO., LTD.
- Current Assignee Address: CN Shenzhen
- Main IPC: H04L12/28
- IPC: H04L12/28 ; H04L5/00 ; H04W28/26

Abstract:
The present disclosure provides for methods, systems and apparatus related to Variable High Throughput (HT) Control Field. An aspect of the disclosure provides for a method performed by a station (STA). The method includes sending, to a second STA, a message including a frame, the frame including a variable high throughput (HT) control field. The variable HT further includes a first subfield indicating an N number of control IDs, wherein N is equal to or more than one. The variable HT further includes N additional subfields. Each of the N additional subfield includes: a control identifier (ID) field and a control information field associated with the Control ID field. The method further includes receiving, from the second STA, a response.
Public/Granted literature
- US20230239119A1 VARIABLE HIGH THROUGHPUT CONTROL FIELD Public/Granted day:2023-07-27
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