Invention Grant
- Patent Title: Fluid introduction module for plasma system
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Application No.: US17525977Application Date: 2021-11-15
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Publication No.: US12150234B2Publication Date: 2024-11-19
- Inventor: Chih-Chiang Weng , Yo-Sung Lee
- Applicant: Industrial Technology Research Institute
- Applicant Address: TW Hsinchu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsinchu
- Agency: JCIPRNET
- Priority: TW110137835 20211012
- Main IPC: H05H1/24
- IPC: H05H1/24 ; B05B3/00

Abstract:
A fluid introduction module for plasma system is adapted for being disposed in a plasma system and includes a rotating nozzle and a precursor supply device. The rotating nozzle includes a main flow channel, a plasma outlet located at an end of the main flow channel, a mixing flow channel that penetrates a side wall of the rotating nozzle and communicates with the main flow channel, an independent flow channel separated from the main flow channel, and a precursor independent outlet located at an end of the independent flow channel. The precursor supply device includes a fixed housing and a rotating bearing. The fixed housing is sleeved outside the rotating nozzle and includes a precursor inlet selectively communicating with either the mixing flow channel or the independent flow channel. The rotating bearing is disposed between the rotating nozzle and the fixed housing.
Public/Granted literature
- US20230112886A1 FLUID INTRODUCTION MODULE FOR PLASMA SYSTEM Public/Granted day:2023-04-13
Information query
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