Invention Grant
- Patent Title: Method and system with deep learning model generation
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Application No.: US16549299Application Date: 2019-08-23
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Publication No.: US12165064B2Publication Date: 2024-12-10
- Inventor: Yeshwanth Venkatesha , Sundeep Krishnadasan , Ankur Deshwal
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: NSIP Law
- Priority: IN201841031680 20180823,IN201841031680 20190820,KR10-2019-0103841 20190823
- Main IPC: G06N3/082
- IPC: G06N3/082 ; G06N3/04

Abstract:
Provided is a method and system with deep learning model generation. The method includes identifying a plurality of connections in a neural network that is pre-associated with a deep learning model, generating a plurality of pruned neural networks by pruning different sets of one or more of the plurality of connections to respectively generate each of the plurality of pruned neural networks, generating a plurality of intermediate deep learning models by generating a respective intermediate deep learning model corresponding to each of the plurality of pruned neural networks, and selecting one of the plurality of intermediate deep learning models, having a determined greatest accuracy among the plurality of intermediate deep learning models, to be an optimized deep learning model.
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