Invention Grant
- Patent Title: Voltage contrast metrology mark
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Application No.: US16772022Application Date: 2018-12-07
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Publication No.: US12169366B2Publication Date: 2024-12-17
- Inventor: Cyrus Emil Tabery , Simon Hendrik Celine Van Gorp , Simon Philip Spencer Hastings , Brennan Peterson
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- International Application: PCT/EP2018/083994 WO 20181207
- International Announcement: WO2019/115391 WO 20190620
- Main IPC: G03F7/00
- IPC: G03F7/00 ; H01L21/66 ; H01L23/544

Abstract:
A measurement mark is disclosed. According to certain embodiments, the measurement mark includes a set of first test structures developed in a first layer on a substrate, each of the set of first test structures comprising a plurality of first features made of first conducting material. The measurement mark also includes a set of second test structures developed in a second layer adjacent to the first layer, each of the set of second test structures comprising a plurality of second features made of second conducting material. The measurement mark is configured to indicate connectivity between the set of first test structures and associated second test structures in the set of second test structures when imaged using a voltage-contrast imaging method.
Public/Granted literature
- US20210088917A1 VOLTAGE CONTRAST METROLOGY MARK Public/Granted day:2021-03-25
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