Invention Grant
- Patent Title: Lithographic apparatus and electrostatic clamp designs
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Application No.: US17773004Application Date: 2020-10-05
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Publication No.: US12174552B2Publication Date: 2024-12-24
- Inventor: Victor Antonio Perez-Falcon , Marcus Adrianus Van De Kerkhof , Daniel Leslie Hall , Christopher John Mason , Arthur Winfried Eduardus Minnaert , Johannes Hubertus Josephina Moors , Samir A. Nayfeh
- Applicant: ASML Holding N.V. , ASML Netherlands B.V.
- Applicant Address: NL Veldhoven; NL Veldhoven
- Assignee: ASML Holding N.V.,ASML Netherlands B.V.
- Current Assignee: ASML Holding N.V.,ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven; NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- International Application: PCT/EP2020/077877 WO 20201005
- International Announcement: WO2021/083617 WO 20210506
- Main IPC: G03F7/00
- IPC: G03F7/00 ; H01L21/683 ; H01L21/687

Abstract:
Embodiments herein describe methods, devices, and systems for reducing an electric field at a clamp-reticle interface using an enhanced electrostatic clamp. In particular, the electrostatic clamp includes a clamp body, an electrode layer disposed on a top surface of the clamp body, and a plurality of burls that project from a bottom surface of the clamp body, wherein the electrode layer comprises a plurality of cutouts at predetermined locations that vertically correspond to locations of the plurality of burls at the bottom surface of the clamp body.
Public/Granted literature
- US20230008474A1 LITHOGRAPHIC APPARATUS AND ELECTROSTATIC CLAMP DESIGNS Public/Granted day:2023-01-12
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