Invention Grant
- Patent Title: Processing system for LIDAR measurements
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Application No.: US17496583Application Date: 2020-08-05
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Publication No.: US12189038B2Publication Date: 2025-01-07
- Inventor: Angus Pacala , Marvin Shu
- Applicant: Ouster, Inc.
- Applicant Address: US CA San Francisco
- Assignee: Ouster, Inc.
- Current Assignee: Ouster, Inc.
- Current Assignee Address: US CA San Francisco
- Agency: Kilpatrick Townsend & Stockton LLP
- International Application: PCT/US2020/045016 WO 20200805
- International Announcement: WO2021/026241 WO 20210211
- Main IPC: G01S17/89
- IPC: G01S17/89 ; G01S7/4865 ; G01S7/487 ; G01S17/894 ; G01S17/931

Abstract:
An optical measurement system may improve the accuracy with which it estimates distances to surrounding objects by upgrading various aspects of its data path. Spatial resolution may be increased by subdividing histogram buckets or integration registers based on spatial location. Saturation at any point in the data path can be detected and used to stop counting photons in individual pixels, which can then be normalized after a measurement is over. Multiple peaks can be detected using recursive or iterative techniques to identify a largest remaining peak at each stage. Instead of iterating through the histogram memory multiple times, a threshold can be pre-calculated based on an estimated ambient noise level, and peaks can be detected in a single pass.
Public/Granted literature
- US20230176223A1 PROCESSING SYSTEM FOR LIDAR MEASUREMENTS Public/Granted day:2023-06-08
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