Invention Grant
- Patent Title: Capacitors of semiconductor device capable of operating in high frequency operation environment
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Application No.: US18462909Application Date: 2023-09-07
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Publication No.: US12191348B2Publication Date: 2025-01-07
- Inventor: Jaeho Lee , Boeun Park , Younggeun Park , Jooho Lee
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2020-0048312 20200421
- Main IPC: H01L23/66
- IPC: H01L23/66 ; H01L49/02

Abstract:
Provided are capacitors of semiconductor devices, wherein the capacitors may be used in a high-frequency operation environment. A capacitor includes a first electrode layer, a dielectric layer on the first electrode layer, and a second electrode layer on the dielectric layer, wherein the dielectric layer includes a plurality of unit dielectric layers, and the unit dielectric layer includes first and second sub-dielectric layers that have different dielectric constants and conductivities from each other and are connected in series, and the first and second sub-dielectric layers have a conductivity difference so that the capacitance of the dielectric layer converges to the capacitance of the unit dielectric layer.
Public/Granted literature
- US20230420487A1 CAPACITORS OF SEMICONDUCTOR DEVICE CAPABLE OF OPERATING IN HIGH FREQUENCY OPERATION ENVIRONMENT Public/Granted day:2023-12-28
Information query
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