Invention Grant
- Patent Title: Pattern inspection method using pattern model
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Application No.: US17737494Application Date: 2022-05-05
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Publication No.: US12205267B2Publication Date: 2025-01-21
- Inventor: Nohong Kwak , Donyun Kim , Kihyun Kim , Yunhyoung Nam
- Applicant: SAMSUNG ELECTRONICS CO., LTD. , Seoul National University R&DB Foundation
- Applicant Address: KR Suwon-si; KR Seoul
- Assignee: SAMSUNG ELECTRONICS CO., LTD.,Seoul National University R&DB Foundation
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.,Seoul National University R&DB Foundation
- Current Assignee Address: KR Suwon-si; KR Seoul
- Agency: Muir Patent Law, PLLC
- Priority: KR10-2021-0131622 20211005
- Main IPC: G06V10/762
- IPC: G06V10/762 ; G06T7/00

Abstract:
A pattern inspection method includes converting sample patterns of a sample image into training images, extracting feature values of the training patterns, setting feature vectors of the training patterns on the basis of the feature values, converting the feature vectors into Gaussian vectors, clustering the Gaussian vectors, thereby sorting the Gaussian vectors into clusters, selecting a select vector from each of the clusters, storing, as a pattern model, the training pattern corresponding to the select vector in a database, converting a target pattern of a target image into an inspection pattern on the basis of the pattern model, and inspecting the inspection pattern.
Public/Granted literature
- US20230115188A1 PATTERN INSPECTION METHOD USING PATTERN MODEL Public/Granted day:2023-04-13
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