Invention Grant
- Patent Title: Mask plate and manufacturing method thereof
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Application No.: US16770183Application Date: 2019-11-12
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Publication No.: US12221684B2Publication Date: 2025-02-11
- Inventor: Shanshan Bai
- Applicant: BOE Technology Group Co., Ltd.
- Applicant Address: CN Beijing
- Assignee: BOE Technology Group Co., Ltd.
- Current Assignee: BOE Technology Group Co., Ltd.
- Current Assignee Address: CN Beijing
- Agency: Nath, Goldberg & Meyer
- Agent Joshua B. Goldberg
- Priority: CN201811338402.7 20181112
- International Application: PCT/CN2019/117513 WO 20191112
- International Announcement: WO2020/098645 WO 20200522
- Main IPC: C23C14/04
- IPC: C23C14/04 ; C23C14/24

Abstract:
The disclosure provides a mask plate and a manufacturing method thereof. The mask plate includes at least one pattern region, each pattern region includes a first opening region and a second opening region which are adjacent to each other along a lengthwise direction of the mask plate, each of the first opening region and the second opening region has a plurality of pattern openings penetrating through the mask plate along a thickness direction of the mask plate, a ratio of a sum of areas of the pattern openings in the second opening region to a total area of the second opening region is greater than a ratio of a sum of areas of the pattern openings in the first opening region to a total area of the first opening region, the first opening region has grooves not penetrating through the mask plate.
Public/Granted literature
- US20210301386A1 MASK PLATE AND MANUFACTURING METHOD THEREOF Public/Granted day:2021-09-30
Information query
IPC分类: