Invention Grant
- Patent Title: Electronic device and manufacturing method and inspection method thereof using transmittance of dielectric
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Application No.: US17736997Application Date: 2022-05-04
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Publication No.: US12237176B2Publication Date: 2025-02-25
- Inventor: Kuang-Ming Fan , Chia-Lin Yang , Liang-Lu Chen
- Applicant: InnoLux Corporation
- Applicant Address: TW Miao-Li County
- Assignee: InnoLux Corporation
- Current Assignee: InnoLux Corporation
- Current Assignee Address: TW Miao-Li County
- Agent Winston Hsu
- Priority: CN202110914382.9 20210810,CN202210016294.1 20220107
- Main IPC: H01L21/48
- IPC: H01L21/48 ; H01L21/66 ; H01L23/498
Abstract:
An electronic device includes a conductive layer, a first dielectric layer, and a second dielectric layer, in which the second dielectric layer is disposed on the first dielectric layer, the conductive layer is disposed between the first dielectric layer and the second dielectric layer, the first dielectric layer has a first transmittance for a light, the second dielectric layer has a second transmittance for the light, and the first transmittance is different from the second transmittance.
Public/Granted literature
- US20230049123A1 ELECTRONIC DEVICE AND MANUFACTURING METHOD AND INSPECTION METHOD THEREOF Public/Granted day:2023-02-16
Information query
IPC分类:
