Invention Grant
- Patent Title: Micromirror arrays
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Application No.: US17635907Application Date: 2020-08-05
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Publication No.: US12276784B2Publication Date: 2025-04-15
- Inventor: Luc Roger Simonne Haspeslagh , Veronique Rochus , Guilherme Brondani Torri , Nitesh Pandey , Sebastianus Adrianus Goorden
- Applicant: ASML Netherlands B.V. , IMEC v.z.w.
- Applicant Address: NL Veldhoven; BE Leuven
- Assignee: ASML Netherlands B.V.,IMEC v.z.w.
- Current Assignee: ASML Netherlands B.V.,IMEC v.z.w.
- Current Assignee Address: NL Veldhoven; BE Leuven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP19192311 20190819,EP19199718 20190926
- International Application: PCT/EP2020/072005 WO 20200805
- International Announcement: WO2021/032483 WO 20210225
- Main IPC: G02B26/08
- IPC: G02B26/08 ; G02B7/18 ; G03F7/00

Abstract:
A micromirror array comprises a substrate, a plurality of minors for reflecting incident light and, for each mirror (20) of the plurality of minors, at least one piezoelectric actuator (21) for displacing the minor, wherein the at least one piezoelectric actuator is connected to the substrate. The micromirror array further comprises one or more pillars (24) connecting the minor to the at least one piezoelectric actuator. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection apparatus.
Public/Granted literature
- US20220283428A1 MICROMIRROR ARRAYS Public/Granted day:2022-09-08
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