发明申请
- 专利标题: Diaphragm cell cathode structure
- 专利标题(中): 隔膜单元阴极结构
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申请号: US09854262申请日: 2001-05-11
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公开(公告)号: US20010030126A1公开(公告)日: 2001-10-18
- 发明人: Richard L. Romine , Thomas F. Florkiewicz , John J. Jahn , Gerald R. Pohto
- 申请人: ELTECH SYSTEMS CORPORATION
- 申请人地址: null
- 专利权人: ELTECH SYSTEMS CORPORATION
- 当前专利权人: ELTECH SYSTEMS CORPORATION
- 当前专利权人地址: null
- 主分类号: C25C007/00
- IPC分类号: C25C007/00 ; C25B009/00
摘要:
An electrolytic cell comprising a walled enclosure including a cathode sidewall has busbar structure external to the cell. The busbar structure can include a gird bar releasably secured at the sidewall. It also may include a foraminous interface member between the gird bar and the sidewall, as well as have a small cathode busbar member on the sidewall. The small busbar member is typically located above and adjacent to the gird bar. Particularly when the gird bar and foraminous interface member are present, there can be internal support members for the cathodes directly secured to the inside face of the cathode sidewall. Furthermore, intercell connection may be handled directly to the outside face of the cathode sidewall. The overall structure can provide reduced potential for sidewall stress corrosion cracking, reduced cathode manufacturing cost, and accommodation of stress relief for the cathode weldment.
公开/授权文献
- US06582571B2 Diaphragm cell cathode structure 公开/授权日:2003-06-24
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